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UV nanosecond laser annealing for Ru interconnects

dc.contributor.authorJourdan, Nicolas
dc.contributor.authorRoze, Fabien
dc.contributor.authorTabata, Toshiyuki
dc.contributor.authorLariviere, Stephane
dc.contributor.authorContino, Antonino
dc.contributor.authorMazzamuto, Fulvio
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-28T23:03:12Z
dc.date.available2021-10-28T23:03:12Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35348
dc.sourceIIOimport
dc.titleUV nanosecond laser annealing for Ru interconnects
dc.typeProceedings paper
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorContino, Antonino
dc.contributor.imecauthorTokei, Zsolt
dc.source.peerreviewyes
dc.source.beginpageFrBT2.6
dc.source.conference23rd IEEE INternational Interconnect Technology Conference - IITC
dc.source.conferencedate5/10/2020
dc.source.conferencelocationvirtual virtual
dc.identifier.urlhttps://conf.papercept.net/conferences/conferences/IITC20/program/IITC20_ContentListWeb_4.html
imec.availabilityPublished - imec


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