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The effect of elevated temperature on the reliability of very thin oxide films

dc.contributor.authorKaczer, Ben
dc.contributor.authorDegraeve, Robin
dc.contributor.authorPangon, Nadège
dc.contributor.authorNigam, Tanya
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-06T11:28:15Z
dc.date.available2021-10-06T11:28:15Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3546
dc.sourceIIOimport
dc.titleThe effect of elevated temperature on the reliability of very thin oxide films
dc.typeProceedings paper
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.source.peerreviewno
dc.source.beginpage356
dc.source.endpage359
dc.source.conferenceESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium.
imec.availabilityPublished - imec


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