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Characterizing variation in EUV contact hole lithography

dc.contributor.authorMack, Chris
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSeveri, Joren
dc.date.accessioned2021-10-29T00:16:30Z
dc.date.available2021-10-29T00:16:30Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35515
dc.sourceIIOimport
dc.titleCharacterizing variation in EUV contact hole lithography
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSeveri, Joren
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage115170K
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography 2020
dc.source.conferencedate21/09/2020
dc.source.conferencelocationMonterey USA
dc.identifier.urlhttps://doi.org/10.1117/12.2572834
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11517


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