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Understanding the significance of local variability in defect-aware process windows

dc.contributor.authorMaslow, Mark John
dc.contributor.authorYaegashi, Hidetami
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorHara, Arisa
dc.contributor.authorCerbu, Dorin
dc.date.accessioned2021-10-29T00:36:21Z
dc.date.available2021-10-29T00:36:21Z
dc.date.issued2020
dc.identifier.issn0894-6507
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35557
dc.sourceIIOimport
dc.titleUnderstanding the significance of local variability in defect-aware process windows
dc.typeJournal article
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.source.peerreviewyes
dc.source.beginpage42
dc.source.endpage52
dc.source.journalIEEE Transactions on Semiconductor Manufacturing
dc.source.issue1
dc.source.volume33
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8935432
imec.availabilityPublished - imec


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