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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

dc.contributor.authorKim, Young-Chang
dc.contributor.authorBeckx, Stephan
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-06T11:30:28Z
dc.date.available2021-10-06T11:30:28Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3557
dc.sourceIIOimport
dc.titleAngle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
dc.typeProceedings paper
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage153
dc.source.endpage156
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesHi, We have full text access to this one: see link on intranet (learning / electronic journals). Solid State Phenmomena; Vols. 65-66


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