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Characterization of HF-last cleaning of ion-implanted Si surfaces

dc.contributor.authorKondoh, Eiichi
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-06T11:32:52Z
dc.date.available2021-10-06T11:32:52Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3569
dc.sourceIIOimport
dc.titleCharacterization of HF-last cleaning of ion-implanted Si surfaces
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage271
dc.source.endpage274
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vols. 65-66


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