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Massive metrology for process development and monitoring applications

dc.contributor.authorSah, Kaushik
dc.contributor.authorDas, Sayantan
dc.contributor.authorLi, S.
dc.contributor.authorBeral, C.
dc.contributor.authorCross, A.
dc.contributor.authorHalder, Sandip
dc.date.accessioned2021-10-29T03:24:42Z
dc.date.available2021-10-29T03:24:42Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35871
dc.sourceIIOimport
dc.titleMassive metrology for process development and monitoring applications
dc.typeProceedings paper
dc.contributor.imecauthorSah, Kaushik
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewyes
dc.source.beginpage1132528
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/03/2020
dc.source.conferencelocationSan Jose,CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2553092
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11325


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