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Effect of inductively coupled electro-magnetic field on bottom oxide etch in a high aspect ratio trench

dc.contributor.authorSardo, Stefano
dc.contributor.authorPalombizio, Antonio
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorMannarino, Manuel
dc.date.accessioned2021-10-29T03:40:13Z
dc.date.available2021-10-29T03:40:13Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35897
dc.sourceIIOimport
dc.titleEffect of inductively coupled electro-magnetic field on bottom oxide etch in a high aspect ratio trench
dc.typeMeeting abstract
dc.contributor.imecauthorSardo, Stefano
dc.contributor.imecauthorPalombizio, Antonio
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorMannarino, Manuel
dc.contributor.orcidimecSardo, Stefano::0000-0002-9302-8007
dc.source.peerreviewyes
dc.source.beginpage1289
dc.source.conference237th ECS Meeting with the 18th International Meeting on Chemical Sensors (IMCS 2020)
dc.source.conferencedate10/05/2020
dc.source.conferencelocationMontreal Canada
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/MA2020-01221289mtgabs#
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA2020-01


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