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Roughness study on line and space patterning with chemo-epitaxy directed self-assembly

dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDudash, Viktor
dc.contributor.authorLorusso, Gian
dc.contributor.authorHer, YoungJun
dc.contributor.authorLi, Jin
dc.contributor.authorMonreal, Victor
dc.contributor.authorBaskaran, Durairaj
dc.contributor.authorALPERSON, BOAZ
dc.contributor.authorSKJONNEMAND, KARL
dc.contributor.authorMack, Chris
dc.date.accessioned2021-10-29T04:57:42Z
dc.date.available2021-10-29T04:57:42Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36029
dc.sourceIIOimport
dc.titleRoughness study on line and space patterning with chemo-epitaxy directed self-assembly
dc.typeProceedings paper
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorDudash, Viktor
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHer, YoungJun
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage113260X
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA California
dc.identifier.urlhttps://doi.org/10.1117/12.2552354
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.11326


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