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Novel monitoring of EUV litho cluster for manufacturing insertion

dc.contributor.authorTruffert, Vincent
dc.contributor.authorAusschnitt, Kit
dc.contributor.authorNair, Vineet Vijayakrishnan
dc.contributor.authorD'have, Koen
dc.date.accessioned2021-10-29T05:29:43Z
dc.date.available2021-10-29T05:29:43Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36081
dc.sourceIIOimport
dc.titleNovel monitoring of EUV litho cluster for manufacturing insertion
dc.typeMeeting abstract
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorAusschnitt, Kit
dc.contributor.imecauthorNair, Vineet Vijayakrishnan
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecNair, Vineet Vijayakrishnan::0000-0002-8970-2425
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.source.peerreviewyes
dc.source.beginpage11323oS
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Diego USA
dc.identifier.urlhttps://doi.org/10.1117/12.2551881
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol.11323


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