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Surface analysis in the semiconductor industry: Present use and future possibilities

dc.contributor.authorvan der Heide, Paul
dc.contributor.authorSpampinato, Valentina
dc.contributor.authorFranquet, Alexis
dc.contributor.authorZborowski, Charlotte
dc.contributor.authorConard, Thierry
dc.contributor.authorLudwig, Jonathan
dc.contributor.authorParedis, Kristof
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPirkl, Alexander
dc.contributor.authorNiehuis, Ewald
dc.date.accessioned2021-10-29T06:06:10Z
dc.date.available2021-10-29T06:06:10Z
dc.date.issued2020
dc.identifier.issn0142-2421
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36141
dc.sourceIIOimport
dc.titleSurface analysis in the semiconductor industry: Present use and future possibilities
dc.typeJournal article
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorZborowski, Charlotte
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorLudwig, Jonathan
dc.contributor.imecauthorParedis, Kristof
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecParedis, Kristof::0000-0002-5163-4164
dc.source.peerreviewyes
dc.source.beginpage786
dc.source.endpage791
dc.source.journalSurface and Interface Analysis
dc.source.issue12
dc.source.volume52
dc.identifier.urlhttps://doi.org/10.1002/sia.6766
imec.availabilityPublished - imec


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