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Evaluation of post metal etch cleaning by analyzing chemical compositions and distributions

dc.contributor.authorLi, H.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorConard, Thierry
dc.contributor.authorBrijs, Bert
dc.contributor.authorMaex, Karen
dc.contributor.authorFroyen, L.
dc.date.accessioned2021-10-14T11:29:36Z
dc.date.available2021-10-14T11:29:36Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3618
dc.sourceIIOimport
dc.titleEvaluation of post metal etch cleaning by analyzing chemical compositions and distributions
dc.typeProceedings paper
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage177
dc.source.endpage180
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenmomena; Vols. 65-66


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