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Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

dc.contributor.authorVandenbroucke, Sofie
dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorMinjauw, Matthias
dc.contributor.authorVan Daele, Michiel
dc.contributor.authorSolano, Eduardo
dc.contributor.authorVos, Rita
dc.contributor.authorDendooven, Jolien
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-29T06:37:50Z
dc.date.available2021-10-29T06:37:50Z
dc.date.issued2020
dc.identifier.issn1463-9076
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36192
dc.sourceIIOimport
dc.titleStudy of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
dc.typeJournal article
dc.contributor.imecauthorVandenbroucke, Sofie
dc.contributor.imecauthorLevrau, Elisabeth
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecVandenbroucke, Sofie::0000-0002-2831-3696
dc.identifier.doi10.1039/d0cp00395f
dc.source.peerreviewyes
dc.source.beginpage9262
dc.source.endpage9271
dc.source.journalPhysical Chemistry Chemical Physics
dc.source.issue17
dc.source.volume22
imec.availabilityPublished - imec


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