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Underlayer optimization method for EUV lithography

dc.contributor.authorVanelderen, Pieter
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorLiang, Y.C.
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGuerrero, Douglas
dc.contributor.authorChacko, A.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-29T06:45:23Z
dc.date.available2021-10-29T06:45:23Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36204
dc.sourceIIOimport
dc.titleUnderlayer optimization method for EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorGuerrero, Douglas
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2551684
dc.source.peerreviewyes
dc.source.beginpage1132615
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11326


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