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Prediction of EUV stochastic microbridge probabilities by lithography simulations

dc.contributor.authorVerduijn, Erik
dc.contributor.authorWelling, Ulrich
dc.contributor.authorTang, Jiuzhou
dc.contributor.authorStock, Hans-Jurgen
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorDemmerle, Wolfgang
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-29T07:10:25Z
dc.date.available2021-10-29T07:10:25Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36243
dc.sourceIIOimport
dc.titlePrediction of EUV stochastic microbridge probabilities by lithography simulations
dc.typeProceedings paper
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorWelling, Ulrich
dc.contributor.imecauthorDe Bisschop, Peter
dc.source.peerreviewyes
dc.source.beginpage113230K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2552236
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11323


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