dc.contributor.author | Vincent, Benjamin | |
dc.contributor.author | Hathwar, R. | |
dc.contributor.author | Kamon, M. | |
dc.contributor.author | Ervin, J. | |
dc.contributor.author | Schram, Tom | |
dc.contributor.author | Chiarella, Thomas | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Baudot, Sylvain | |
dc.contributor.author | Siew, Yong Kong | |
dc.contributor.author | Kubicek, Stefan | |
dc.contributor.author | Dentoni Litta, Eugenio | |
dc.contributor.author | Chew, Soon Aik | |
dc.contributor.author | Mitard, Jerome | |
dc.date.accessioned | 2021-10-29T07:29:49Z | |
dc.date.available | 2021-10-29T07:29:49Z | |
dc.date.issued | 2020 | |
dc.identifier.issn | 0018-9383 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/36274 | |
dc.source | IIOimport | |
dc.title | Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vincent, Benjamin | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Chiarella, Thomas | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Baudot, Sylvain | |
dc.contributor.imecauthor | Siew, Yong Kong | |
dc.contributor.imecauthor | Kubicek, Stefan | |
dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
dc.contributor.imecauthor | Chew, Soon Aik | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
dc.contributor.orcidimec | Chew, Soon Aik::0000-0003-3013-4846 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.source.peerreview | yes | |
dc.source.beginpage | 5374 | |
dc.source.endpage | 5380 | |
dc.source.journal | IEEE Transactions on Electron Devices | |
dc.source.issue | 12 | |
dc.source.volume | 67 | |
dc.identifier.url | https://ieeexplore.ieee.org/document/9222056 | |
imec.availability | Published - imec | |