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dc.contributor.authorVincent, Benjamin
dc.contributor.authorHathwar, R.
dc.contributor.authorKamon, M.
dc.contributor.authorErvin, J.
dc.contributor.authorSchram, Tom
dc.contributor.authorChiarella, Thomas
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBaudot, Sylvain
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorChew, Soon Aik
dc.contributor.authorMitard, Jerome
dc.date.accessioned2021-10-29T07:29:49Z
dc.date.available2021-10-29T07:29:49Z
dc.date.issued2020
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36274
dc.sourceIIOimport
dc.titleProcess variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle
dc.typeJournal article
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorChew, Soon Aik
dc.contributor.imecauthorMitard, Jerome
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecChew, Soon Aik::0000-0003-3013-4846
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.source.peerreviewyes
dc.source.beginpage5374
dc.source.endpage5380
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue12
dc.source.volume67
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9222056
imec.availabilityPublished - imec


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