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Impact of EUV resist thickness on local critical dimension uniformities for sub-30 nm CD Via Patterning
Publication:
Impact of EUV resist thickness on local critical dimension uniformities for sub-30 nm CD Via Patterning
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Date
2020
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vincent, Benjamin
;
Maslow, Mask
;
Bekaert, Joost
;
Mao, Ming
;
Ervin, Joseph
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2033
since deposited on 2021-10-29
Acq. date: 2026-01-09
Citations
Metrics
Views
2033
since deposited on 2021-10-29
Acq. date: 2026-01-09
Citations