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dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-14T11:29:42Z
dc.date.available2021-10-14T11:29:42Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3630
dc.sourceIIOimport
dc.titleCompetitive adsorption of cations onto the silicon surface: the role of ammonium ion in APM
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1070
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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