Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

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Authors
Wiaux, Vincent; Bekaert, Joost; Kovalevich, Tatiana; Ryckaert, Julien; Hendrickx, Eric; Davydova, Natalia; Woltgens, Pieter; de Winter, Laurens; Maslow, Mark; Troost, Kars; Tien, Ming-Chun
Conference
Extreme Ultraviolet Lithography 2020
Title
Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
Publication type
Proceedings paper
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