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Carrier profiling in high vacuum using Scanning Spreading Resistance Microscopy and Scanning Capacitance Microscopy

dc.contributor.authorWouters, Lennaert
dc.contributor.authorMinj, Albert
dc.contributor.authorCelano, Umberto
dc.contributor.authorHantschel, Thomas
dc.contributor.authorParedis, Kristof
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-29T08:12:35Z
dc.date.available2021-10-29T08:12:35Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36338
dc.sourceIIOimport
dc.titleCarrier profiling in high vacuum using Scanning Spreading Resistance Microscopy and Scanning Capacitance Microscopy
dc.typeJournal article
dc.contributor.imecauthorWouters, Lennaert
dc.contributor.imecauthorMinj, Albert
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorParedis, Kristof
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecWouters, Lennaert::0000-0002-6730-9542
dc.contributor.orcidimecMinj, Albert::0000-0003-0878-3276
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecParedis, Kristof::0000-0002-5163-4164
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1
dc.source.endpage5
dc.source.journalPark Systems.com: Application Note #54
dc.identifier.urlhttps://parksystems.com/images/media/appnote/SSRM-SCM-in-HV_AppNote54_Park-Systems.pdf
imec.availabilityPublished - open access


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