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Improving EUV underlayer coating defectivity using point-of-use filtration

dc.contributor.authorWu, Aiwen
dc.contributor.authorBayana, Hareen
dc.contributor.authorFoubert, Philippe
dc.contributor.authorChacko, Andrea
dc.contributor.authorGuerrero, Douglas
dc.date.accessioned2021-10-29T08:14:31Z
dc.date.available2021-10-29T08:14:31Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36341
dc.sourceIIOimport
dc.titleImproving EUV underlayer coating defectivity using point-of-use filtration
dc.typeProceedings paper
dc.contributor.imecauthorBayana, Hareen
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorGuerrero, Douglas
dc.source.peerreviewyes
dc.source.beginpage113261Z
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan José, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2551647
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11326


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