Concurrent design rule, OPC and process optimization in EUV lithography

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Authors
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Lee, Jae Uk; Kim, Ryan Ryoung han
Conference
Design-Process-Technology Co-optimization for Manufacturability XIV
Title
Concurrent design rule, OPC and process optimization in EUV lithography
Publication type
Meeting abstract
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