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Etch tool pressure optimization enabling wafer edge overlay control.

dc.contributor.authorYildirim, Oktay
dc.contributor.authorvan Haren, Richard
dc.contributor.authorMouraille, Orion
dc.contributor.authorvan Dijk, Leon
dc.contributor.authorHermans, Jan
dc.contributor.authorKumar, Kaushik
dc.contributor.authorFeurprier, Yannick
dc.date.accessioned2021-10-29T08:42:29Z
dc.date.available2021-10-29T08:42:29Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36382
dc.sourceIIOimport
dc.titleEtch tool pressure optimization enabling wafer edge overlay control.
dc.typeOral presentation
dc.contributor.imecauthorYildirim, Oktay
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.source.peerreviewno
dc.source.conferenceASML Technology Conference 2020
dc.source.conferencedate10/06/2020
dc.source.conferencelocationEindhoven The Netherlands
imec.availabilityPublished - imec


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