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Matching simulation and experiment for chemically amplified resists

dc.contributor.authorMack, C.
dc.contributor.authorErcken, Monique
dc.contributor.authorMoelants, Myriam
dc.date.accessioned2021-10-14T11:29:49Z
dc.date.available2021-10-14T11:29:49Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3639
dc.sourceIIOimport
dc.titleMatching simulation and experiment for chemically amplified resists
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMoelants, Myriam
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage183
dc.source.endpage192
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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