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Area-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films

dc.contributor.authorZyulkov, Ivan
dc.contributor.authorMadhivala, Viraj
dc.contributor.authorVoronina, Ekaterina
dc.contributor.authorSnelgrove, Matthew
dc.contributor.authorBogan, Justin
dc.contributor.authorO'Connor, Rob
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-29T09:11:32Z
dc.date.available2021-10-29T09:11:32Z
dc.date.issued2020
dc.identifier.issn1944-8244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36424
dc.sourceIIOimport
dc.titleArea-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films
dc.typeJournal article
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.identifier.doi10.1021/acsami.9b14596
dc.source.peerreviewyes
dc.source.beginpage4678
dc.source.endpage4688
dc.source.journalACS Applied Materials & Interfaces
dc.source.issue4
dc.source.volume12
imec.availabilityPublished - imec


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