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Feasibility of printing 0.1μm technology with optical lithography

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorRonse, Kurt
dc.contributor.authorFlagello, D.
dc.contributor.authorGeh, B.
dc.contributor.authorKaiser, W.
dc.date.accessioned2021-10-14T11:29:51Z
dc.date.available2021-10-14T11:29:51Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3642
dc.sourceIIOimport
dc.titleFeasibility of printing 0.1μm technology with optical lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage347
dc.source.endpage357
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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