dc.contributor.author | Ciesielski, Richard | |
dc.contributor.author | Saadeh, Qais | |
dc.contributor.author | Naujok, Philipp | |
dc.contributor.author | Opsomer, Karl | |
dc.contributor.author | Soulie, Jean-Philippe | |
dc.contributor.author | Wu, Meiyi | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Van de Kruijs, Robbert | |
dc.contributor.author | Kolbe, Michael | |
dc.contributor.author | Scholze, Frank | |
dc.contributor.author | Soltwisch, Victor | |
dc.date.accessioned | 2021-10-31T08:13:56Z | |
dc.date.available | 2021-10-31T08:13:56Z | |
dc.date.issued | 2021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/36574 | |
dc.source | IIOimport | |
dc.title | Optical constants for EUV scatterometry | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Opsomer, Karl | |
dc.contributor.imecauthor | Soulie, Jean-Philippe | |
dc.contributor.imecauthor | Wu, Meiyi | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Soulie, Jean-Philippe::0000-0002-5956-6485 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.source.peerreview | yes | |
dc.source.beginpage | 117830M | |
dc.source.conference | Modeling Aspects in Optical Metrology VII | |
dc.source.conferencedate | 21/06/2021 | |
dc.source.conferencelocation | online online | |
imec.availability | Published - imec | |
imec.internalnotes | Proc. of SPIE; Vol. 11783 | |