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dc.contributor.authorCiesielski, Richard
dc.contributor.authorSaadeh, Qais
dc.contributor.authorNaujok, Philipp
dc.contributor.authorOpsomer, Karl
dc.contributor.authorSoulie, Jean-Philippe
dc.contributor.authorWu, Meiyi
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorVan de Kruijs, Robbert
dc.contributor.authorKolbe, Michael
dc.contributor.authorScholze, Frank
dc.contributor.authorSoltwisch, Victor
dc.date.accessioned2021-10-31T08:13:56Z
dc.date.available2021-10-31T08:13:56Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36574
dc.sourceIIOimport
dc.titleOptical constants for EUV scatterometry
dc.typeProceedings paper
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorSoulie, Jean-Philippe
dc.contributor.imecauthorWu, Meiyi
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecSoulie, Jean-Philippe::0000-0002-5956-6485
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage117830M
dc.source.conferenceModeling Aspects in Optical Metrology VII
dc.source.conferencedate21/06/2021
dc.source.conferencelocationonline online
imec.availabilityPublished - imec
imec.internalnotesProc. of SPIE; Vol. 11783


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