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Advanced cleaning for the growth of ultrathin gate oxide

dc.contributor.authorMertens, Paul
dc.contributor.authorBearda, Twan
dc.contributor.authorHoussa, Michel
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenis, Karine
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:30:38Z
dc.date.available2021-10-14T11:30:38Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3672
dc.sourceIIOimport
dc.titleAdvanced cleaning for the growth of ultrathin gate oxide
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage199
dc.source.endpage206
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume48
imec.availabilityPublished - open access
imec.internalnotesProceedings of the 11th Biennial Conf. on Insulating Films on Semiconductors - INFOS '99. 16-19 June, 1999. Kloster Banz, Germany


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