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Massive e-beam metrology and inspection for analysis of EUV stochastic defect

dc.contributor.authorKang, Seulki
dc.contributor.authorMaruyama, K.
dc.contributor.authorYamazaki, Z.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorLorusso, Gian
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-31T09:07:58Z
dc.date.available2021-10-31T09:07:58Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36833
dc.sourceIIOimport
dc.titleMassive e-beam metrology and inspection for analysis of EUV stochastic defect
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.identifier.doi10.1117/12.2584696
dc.source.peerreviewno
dc.source.beginpage1161129
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate22/02/2021
dc.source.conferencelocationonline online
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11611


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