dc.contributor.author | Ke, Tung Huei | |
dc.contributor.author | Mona Sandehang, Calvin | |
dc.contributor.author | Molina Alvarez, Gema | |
dc.contributor.author | Vandenplas, Erwin | |
dc.contributor.author | Mac Ciarnain, Rossa | |
dc.contributor.author | Malinowski, Pawel | |
dc.contributor.author | Genoe, Jan | |
dc.contributor.author | Heremans, Paul | |
dc.date.accessioned | 2021-10-31T09:11:00Z | |
dc.date.available | 2021-10-31T09:11:00Z | |
dc.date.issued | 2021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/36844 | |
dc.source | IIOimport | |
dc.title | FMM-free OLED Manufacturing Enabled by Photolithographic Patterning Processes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Ke, Tung Huei | |
dc.contributor.imecauthor | Molina Alvarez, Gema | |
dc.contributor.imecauthor | Vandenplas, Erwin | |
dc.contributor.imecauthor | Mac Ciarnain, Rossa | |
dc.contributor.imecauthor | Malinowski, Pawel | |
dc.contributor.imecauthor | Genoe, Jan | |
dc.contributor.imecauthor | Heremans, Paul | |
dc.contributor.orcidimec | Ke, Tung Huei::0000-0001-8381-4998 | |
dc.contributor.orcidimec | Malinowski, Pawel::0000-0002-2934-470X | |
dc.contributor.orcidimec | Genoe, Jan::0000-0002-4019-5979 | |
dc.contributor.orcidimec | Heremans, Paul::0000-0003-2151-1718 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 655 | |
dc.source.endpage | 658 | |
dc.source.conference | International Conference on Display Technology, ICDT 2021 | |
dc.source.conferencedate | 30/05/2021 | |
dc.source.conferencelocation | Virtual Virtual | |
dc.identifier.url | https://sid.onlinelibrary.wiley.com/doi/abs/10.1002/sdtp.15238 | |
imec.availability | Published - imec | |