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Effect of surface chemistry on Ruthenium wet etching

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorDoms, Mathias
dc.contributor.authorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-31T09:23:37Z
dc.date.available2021-10-31T09:23:37Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36886
dc.sourceIIOimport
dc.titleEffect of surface chemistry on Ruthenium wet etching
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.beginpage303
dc.source.endpage306
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces (UCPSS)
dc.source.conferencedate12/04/2021
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://doi.org/10.4028/www.scientific.net/SSP.314.302
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 314


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