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ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

dc.contributor.authorMulkens, J.
dc.contributor.authorStoeldraijer, J.
dc.contributor.authorDavies, G.
dc.contributor.authorDierichs, M.
dc.contributor.authorHeskamp, B.
dc.contributor.authorMoers, M. H.
dc.contributor.authorGeorge, R. A.
dc.contributor.authorRoempp, O.
dc.contributor.authorGlatzel, H.
dc.contributor.authorWagner, C.
dc.contributor.authorPollers, Ingrid
dc.contributor.authorJaenen, Patrick
dc.date.accessioned2021-10-14T11:31:13Z
dc.date.available2021-10-14T11:31:13Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3689
dc.sourceIIOimport
dc.titleArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
dc.typeProceedings paper
dc.contributor.imecauthorJaenen, Patrick
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage506
dc.source.endpage521
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3679


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