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The unavoidable renaissance of electron metrology in the age of High NA EUV

dc.contributor.authorLorusso, Gian
dc.date.accessioned2021-10-31T09:35:59Z
dc.date.available2021-10-31T09:35:59Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36923
dc.sourceIIOimport
dc.titleThe unavoidable renaissance of electron metrology in the age of High NA EUV
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.source.peerreviewyes
dc.source.beginpage1161127
dc.source.conferenceMetrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose California
dc.identifier.urlhttps://doi.org/10.1117/12.2583828
imec.availabilityPublished - imec
imec.internalnotesProceeedings of SPIE; Vol. 11611


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