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Electroless Rhodium Deposition for Metallization of Advanced Interconnects

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorViviani, Prisca
dc.date.accessioned2021-10-31T10:23:31Z
dc.date.available2021-10-31T10:23:31Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37056
dc.sourceIIOimport
dc.titleElectroless Rhodium Deposition for Metallization of Advanced Interconnects
dc.typeMeeting abstract
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.source.peerreviewyes
dc.source.beginpage1007
dc.source.conference239th Meeting of The Electrochemical Society Symp. G01: Silicon Compatible Emerging Materials, Processes, and Technologies ...
dc.source.conferencedate30/05/2021
dc.source.conferencelocationChicago, iL USA
dc.identifier.urlhttps://ecs.confex.com/ecs/239/meetingapp.cgi/Paper/146430
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA2021-01


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