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Mask is key to unlock full EUVL potential

dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2021-10-31T10:23:51Z
dc.date.available2021-10-31T10:23:51Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37057
dc.sourceIIOimport
dc.titleMask is key to unlock full EUVL potential
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.identifier.doi10.1117/12.2584583
dc.source.peerreviewno
dc.source.beginpage1160904
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedate22/02/2021
dc.source.conferencelocationonline
dc.identifier.urlhttps://doi.org/10.1117/12.2584583
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11609


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