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High Aspect Ratio Supervia Dual Damascene etch for iN5 and beyond

dc.contributor.authorPuliyalil, Harinarayanan
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorOikawa, Noriaki
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorBriggs, Basoene
dc.contributor.authorMontero Alvarez, Daniel
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorTokei, Zsolt
dc.contributor.authorSatoru, Nakamura
dc.contributor.authorTahara, Shigeru
dc.contributor.authorKumar, Kaushik
dc.date.accessioned2021-10-31T10:29:41Z
dc.date.available2021-10-31T10:29:41Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37072
dc.sourceIIOimport
dc.titleHigh Aspect Ratio Supervia Dual Damascene etch for iN5 and beyond
dc.typeMeeting abstract
dc.contributor.imecauthorPuliyalil, Harinarayanan
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorOikawa, Noriaki
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorMontero Alvarez, Daniel
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.orcidimecPuliyalil, Harinarayanan::0000-0002-9749-5307
dc.contributor.orcidimecMontero Alvarez, Daniel::0000-0001-9966-0399
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.source.peerreviewno
dc.source.conferenceAVS 67th International Symposium and Exhibition
dc.source.conferencedate24/10/2021
dc.source.conferencelocationonline online
dc.identifier.urlhttps://www.avssymposium.org/AVS2021/Sessions/Schedule/70702
imec.availabilityPublished - imec
imec.internalnotesPS-Contributed On Demand-22


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