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Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes

dc.contributor.authorSah, Kaushik
dc.contributor.authorCross, Andrew
dc.contributor.authorDas, Sayantan
dc.contributor.authorBlanco, Victor
dc.contributor.authorKljucar, Luka
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-31T10:54:32Z
dc.date.available2021-10-31T10:54:32Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37134
dc.sourceIIOimport
dc.titleDefect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes
dc.typeProceedings paper
dc.contributor.imecauthorSah, Kaushik
dc.contributor.imecauthorCross, Andrew
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorKljucar, Luka
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewno
dc.source.beginpage116112H
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXV
dc.source.conferencedate22/02/2021
dc.source.conferencelocationSan Jose,CA United States
dc.identifier.urlhttps://doi.org/10.1117/12.2585779
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE: Vol. 11611


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