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dc.contributor.authorSaib, Mohamed
dc.contributor.authorLorusso, Gian
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorKondo, Tsuyoshi
dc.contributor.authorKawamoto, Yuta
dc.contributor.authorEbizuka, Yasushi
dc.contributor.authorBan, Naoma
dc.date.accessioned2021-10-31T10:54:58Z
dc.date.available2021-10-31T10:54:58Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37135
dc.sourceIIOimport
dc.titleMultivariate analysis methodology for the study of massive multidimensional SEM data
dc.typeProceedings paper
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorKondo, Tsuyoshi
dc.contributor.imecauthorKawamoto, Yuta
dc.source.peerreviewyes
dc.source.beginpage116112C
dc.source.conferenceMetrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2583696
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11611


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