dc.contributor.author | Saib, Mohamed | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Kondo, Tsuyoshi | |
dc.contributor.author | Kawamoto, Yuta | |
dc.contributor.author | Ebizuka, Yasushi | |
dc.contributor.author | Ban, Naoma | |
dc.date.accessioned | 2021-10-31T10:54:58Z | |
dc.date.available | 2021-10-31T10:54:58Z | |
dc.date.issued | 2021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37135 | |
dc.source | IIOimport | |
dc.title | Multivariate analysis methodology for the study of massive multidimensional SEM data | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Saib, Mohamed | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Kondo, Tsuyoshi | |
dc.contributor.imecauthor | Kawamoto, Yuta | |
dc.source.peerreview | yes | |
dc.source.beginpage | 116112C | |
dc.source.conference | Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | |
dc.source.conferencedate | 21/02/2021 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://doi.org/10.1117/12.2583696 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 11611 | |