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Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography

dc.contributor.authorSantaclara, Jara G
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorBekaert, Joost
dc.contributor.authorThiam, Arame
dc.contributor.authorMaslow, Mark
dc.contributor.authorHoefnagels, Rik
dc.contributor.authorZuurbier, Nadia
dc.contributor.authorvan Lent, Lidia
dc.contributor.authorFong Choi, Yin
dc.date.accessioned2021-10-31T10:59:48Z
dc.date.available2021-10-31T10:59:48Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37147
dc.sourceIIOimport
dc.titleToday's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorHoefnagels, Rik
dc.contributor.imecauthorZuurbier, Nadia
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage1161204
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVIII
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2586645
imec.availabilityPublished - imec
imec.internalnotesProceedingsof SPIE; Vol. 11612


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