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Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system

dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorMannaert, Geert
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorDoise, Jan
dc.date.accessioned2021-10-31T11:29:37Z
dc.date.available2021-10-31T11:29:37Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37216
dc.sourceIIOimport
dc.titleDevelopment of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
dc.typeProceedings paper
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorDoise, Jan
dc.source.peerreviewyes
dc.source.beginpage116120P
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVIII
dc.source.conferencedate21/02/2021
dc.source.conferencelocationonline online
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11612/116120P/Development-of-high-chi-directed-self-assembly-process-based-on/10.1117/12.2585169.short?SSO=1
imec.availabilityPublished - imec
imec.internalnotesProc. of SPIE; Vol. 11612


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