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Moiré effect-based Overlay target design for OPO improvements

dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.contributor.authorHajaj, E.
dc.contributor.authorShaphirov, D.
dc.contributor.authorAshwal, E.
dc.contributor.authorDror, C.
dc.contributor.authorYohanan, R.
dc.contributor.authorGhinovker, M.
dc.contributor.authorGordon, K.
dc.contributor.authorLiu, Z.
dc.contributor.authorLiu, X.
dc.contributor.authorGronheid, Roel
dc.contributor.authorSpielberg, H.
dc.date.accessioned2021-10-31T11:57:26Z
dc.date.available2021-10-31T11:57:26Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37279
dc.sourceIIOimport
dc.titleMoiré effect-based Overlay target design for OPO improvements
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.beginpage1161125
dc.source.conferenceSPIE Advanced Lithography
dc.source.conferencedate22/02/2021
dc.source.conferencelocationonline online
imec.availabilityPublished - imec
imec.internalnotesProceedings of the SPIE, Vol. 11611


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