Show simple item record

On product overlay characterization after stressed layer etch

dc.contributor.authorvan Haren, Richard
dc.contributor.authorMouraille, Orion
dc.contributor.authorYildirim, Oktay
dc.contributor.authorVan Dijk, Leon
dc.contributor.authorKumar, Kaushik
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorHermans, Jan
dc.date.accessioned2021-10-31T12:02:04Z
dc.date.available2021-10-31T12:02:04Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37289
dc.sourceIIOimport
dc.titleOn product overlay characterization after stressed layer etch
dc.typeProceedings paper
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorYildirim, Oktay
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.source.peerreviewyes
dc.source.beginpage116150N
dc.source.conferenceAdvanced Etch Technology and Process Integration for Nanopatterning X
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2584311
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11615


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record