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Better prediction on patterning failure mode with hotspot aware OPC modeling

dc.contributor.authorWei, Chih-I
dc.contributor.authorWu, Stewart
dc.contributor.authorDeng, Yunfei
dc.contributor.authorKhaira, Gurdaman
dc.contributor.authorKusnadi, I.
dc.contributor.authorFenger, G.
dc.contributor.authorKang, S.
dc.contributor.authorOkamoto, Y.
dc.contributor.authorMaruyama, K.
dc.contributor.authorYamaszaki, Y.
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorGillijns, Werner
dc.contributor.authorLorusso, Gian
dc.date.accessioned2021-10-31T12:42:17Z
dc.date.available2021-10-31T12:42:17Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37372
dc.sourceIIOimport
dc.titleBetter prediction on patterning failure mode with hotspot aware OPC modeling
dc.typeProceedings paper
dc.contributor.imecauthorWu, Stewart
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.source.peerreviewno
dc.source.beginpage1161112
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate22/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2583837
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11611


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