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Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
dc.contributor.author | Rathore, Ashish | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Kumar, Sunkuru S. | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-11-02T15:55:45Z | |
dc.date.available | 2021-11-02T15:55:45Z | |
dc.date.issued | 2021-JUL | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000703599200017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37470 | |
dc.source | WOS | |
dc.title | Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Rathore, Ashish | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.identifier.doi | 10.1117/1.JMM.20.3.034602 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 3 | |
dc.source.volume | 20 | |
imec.availability | Under review |
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