Notice

This item has not yet been validated by imec staff.

Notice

This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/37471.7

Show simple item record

Special Series Guest Editorial: EUV Masks

dc.contributor.authorBurkhardt, Martin
dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2022-04-19T08:47:44Z
dc.date.available2021-11-02T15:55:45Z
dc.date.available2022-03-28T11:51:37Z
dc.date.available2022-04-08T08:44:11Z
dc.date.available2022-04-11T06:47:35Z
dc.date.available2022-04-19T08:47:44Z
dc.date.issued2021
dc.identifier.issn1932-5150
dc.identifier.otherWOS:000703599200003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37471.6
dc.sourceWOS
dc.titleSpecial Series Guest Editorial: EUV Masks
dc.typeEditorial material
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.identifier.doi10.1117/1.JMM.20.3.031008
dc.source.numberofpages2
dc.source.peerreviewyes
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.issue3
dc.source.volume20
imec.availabilityUnder review


Files in this item

Thumbnail
Name:
EditorialJM3_EUVMasks_2021.pdf
Size:
57.64Kb
Format:
PDF
Description:
Published version
View/open

This item appears in the following collection(s)

Show simple item record

Version history

VersionItemDateSummary
720.500.12860/37471.72022-04-21T08:10:42Zvalidation by library/open access desk
620.500.12860/37471.6*2022-04-19T08:43:32Zvalidation by imec author
420.500.12860/37471.42022-04-11T06:46:54Zvalidation by imec author
320.500.12860/37471.32022-04-08T08:41:40Zvalidation by imec author
220.500.12860/37471.22022-03-28T11:49:25Zvalidation by imec author
120.500.12860/374712021-11-02T15:55:45Z

*Selected version