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Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity
dc.contributor.author | Clerix, Jan-Willem J. | |
dc.contributor.author | Marques, Esteban A. | |
dc.contributor.author | Soethoudt, Job | |
dc.contributor.author | Grillo, Fabio | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Van Ommen, J. Ruud | |
dc.contributor.author | Delabie, Annelies | |
dc.date.accessioned | 2021-11-02T15:56:56Z | |
dc.date.available | 2021-11-02T15:56:56Z | |
dc.date.issued | 2021-OCT | |
dc.identifier.issn | 2196-7350 | |
dc.identifier.other | WOS:000698502900001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37558 | |
dc.source | WOS | |
dc.title | Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity | |
dc.type | Journal article | |
dc.contributor.imecauthor | Clerix, Jan-Willem J. | |
dc.contributor.imecauthor | Marques, Esteban A. | |
dc.contributor.imecauthor | Soethoudt, Job | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidext | Van Ommen, J. Ruud::0000-0001-7884-0323 | |
dc.contributor.orcidimec | Clerix, Jan-Willem J.::0000-0002-2681-4569 | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.identifier.doi | 10.1002/admi.202100846 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.journal | ADVANCED MATERIALS INTERFACES | |
dc.source.issue | 20 | |
dc.source.volume | 8 | |
imec.availability | Under review |
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