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Intra-wafer CD-control in state-of-the-art lithography

dc.contributor.authorPollentier, Ivan
dc.contributor.authorBaerts, Christina
dc.contributor.authorMarschner, Thomas
dc.contributor.authorRonse, Kurt
dc.contributor.authorGrozev, Grozdan
dc.contributor.authorReybrouck, Mario
dc.date.accessioned2021-10-14T11:34:27Z
dc.date.available2021-10-14T11:34:27Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3758
dc.sourceIIOimport
dc.titleIntra-wafer CD-control in state-of-the-art lithography
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorGrozev, Grozdan
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage882
dc.source.endpage892
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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