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Low Frequency Noise: A Show Stopper for State-of-the-art and Future Si, Ge-based and III-V Technologies

dc.contributor.authorClaeys, C.
dc.contributor.authorOliviera, A.
dc.contributor.authorHe, L.
dc.contributor.authorTakakura, K.
dc.contributor.authorVeloso, Anabela
dc.contributor.authorPutcha, Vamsi
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorSimoen, Eddy
dc.date.accessioned2021-11-29T10:51:41Z
dc.date.available2021-11-02T15:58:13Z
dc.date.available2021-11-29T10:51:41Z
dc.date.issued2021
dc.identifier.issnna
dc.identifier.otherWOS:000675595800153
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37668.2
dc.sourceWOS
dc.titleLow Frequency Noise: A Show Stopper for State-of-the-art and Future Si, Ge-based and III-V Technologies
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorPutcha, Vamsi
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecPutcha, Vamsi::0000-0003-1907-5486
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.identifier.doi10.1109/EDTM50988.2021.9420967
dc.identifier.eisbn978-1-7281-8176-9
dc.source.numberofpages3
dc.source.peerreviewyes
dc.source.conference5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
dc.source.conferencedateAPR 08-11, 2021
dc.source.conferencelocationChengdu
dc.source.journalna
imec.availabilityPublished - imec


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220.500.12860/37668.2*2021-11-29T10:49:02Zvalidation by library/open access desk
120.500.12860/376682021-11-02T15:58:13Z

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