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Low Frequency Noise: A Show Stopper for State-of-the-art and Future Si, Ge-based and III-V Technologies
dc.contributor.author | Claeys, C. | |
dc.contributor.author | Oliviera, A. | |
dc.contributor.author | Veloso, A. | |
dc.contributor.author | He, L. | |
dc.contributor.author | Takakura, K. | |
dc.contributor.author | Putcha, V | |
dc.contributor.author | Amimura, H. | |
dc.contributor.author | Simoen, E. | |
dc.date.accessioned | 2021-11-02T15:58:13Z | |
dc.date.available | 2021-11-02T15:58:13Z | |
dc.date.issued | 2021 | |
dc.identifier.other | WOS:000675595800153 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37668 | |
dc.source | WOS | |
dc.title | Low Frequency Noise: A Show Stopper for State-of-the-art and Future Si, Ge-based and III-V Technologies | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Veloso, A. | |
dc.contributor.imecauthor | Putcha, V | |
dc.contributor.imecauthor | Amimura, H. | |
dc.contributor.imecauthor | Simoen, E. | |
dc.identifier.doi | 10.1109/EDTM50988.2021.9420967 | |
dc.identifier.eisbn | 978-1-7281-8176-9 | |
dc.source.numberofpages | 3 | |
dc.source.peerreview | yes | |
dc.source.conference | 5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM) | |
dc.source.conferencedate | APR 08-11, 2021 | |
dc.source.conferencelocation | Chengdu | |
imec.availability | Under review |
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