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dc.contributor.authorClaeys, C.
dc.contributor.authorOliviera, A.
dc.contributor.authorVeloso, A.
dc.contributor.authorHe, L.
dc.contributor.authorTakakura, K.
dc.contributor.authorPutcha, V
dc.contributor.authorAmimura, H.
dc.contributor.authorSimoen, E.
dc.date.accessioned2021-11-02T15:58:13Z
dc.date.available2021-11-02T15:58:13Z
dc.date.issued2021
dc.identifier.otherWOS:000675595800153
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37668
dc.sourceWOS
dc.titleLow Frequency Noise: A Show Stopper for State-of-the-art and Future Si, Ge-based and III-V Technologies
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, A.
dc.contributor.imecauthorPutcha, V
dc.contributor.imecauthorAmimura, H.
dc.contributor.imecauthorSimoen, E.
dc.identifier.doi10.1109/EDTM50988.2021.9420967
dc.identifier.eisbn978-1-7281-8176-9
dc.source.numberofpages3
dc.source.peerreviewyes
dc.source.conference5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
dc.source.conferencedateAPR 08-11, 2021
dc.source.conferencelocationChengdu
imec.availabilityUnder review


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