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Variable threshold resist models for lithography simulation

dc.contributor.authorRandall, John
dc.contributor.authorRonse, Kurt
dc.contributor.authorMarschner, Thomas
dc.contributor.authorGoethals, Mieke
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-14T11:35:11Z
dc.date.available2021-10-14T11:35:11Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3770
dc.sourceIIOimport
dc.titleVariable threshold resist models for lithography simulation
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage176
dc.source.endpage182
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate17/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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